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. SKIP THE DISTRIBUTION OF SOFTWARE..1. Field of the Invention
The present invention relates to a semiconductor light emitting device and method of manufacturing the same, and more particularly, to a semiconductor light emitting device, such as an ultraviolet light emitting diode and an ultraviolet laser diode, which has a high photoelectrical conversion efficiency and a long life time and a method of manufacturing the same.
2. Discussion of the Background
Generally, a semiconductor light emitting device has a structure which includes a semiconductor substrate, a first conductive type semiconductor layer disposed on the semiconductor substrate, an active layer disposed on the first conductive type semiconductor layer and including P-N junction, a second conductive type semiconductor layer disposed on the active layer and having a P-N junction with the active layer, and a second conductive type conductive pad electrode formed on the second conductive type semiconductor layer. The active layer is typically a multiple quantum well (MQW) structure formed of quantum wells which include well layers of a well material and barrier layers which are made of barrier materials. The conductive pads are typically disposed around each light emitting region.
FIGS. 1A-1D illustrate partial cross-sectional views of a conventional semiconductor light emitting device and a method of manufacturing the same.
Referring to FIG. 1A, a conventional semiconductor light emitting device 10 includes a substrate 12 and a plurality of silicon-based epi-wafer structures 14 stacked on the substrate 12. The plurality of silicon-based epi-wafer structures 14 may include a plurality of silicon-based substrate structures 14A and 14B having a first conductive type conductive region 12A disposed on the substrate 12. The plurality of silicon-based substrate structures 14A and 14B may be stacked on the substrate 12 in any order, and may be identical to each other.
Referring to FIG. 1B, epitaxial layers (epi-wafer structures) are grown on the plurality of silicon-based epi-wafer structures 14, thereby forming a plurality of light emitting structures 16. The plurality of light emitting structures 16 may have a sacrificial layer structure 18 formed therebetween.
Then, after a heat treatment process, as shown in FIG. 1C, silicon from the sacrificial layer structure 18 and the plurality of silicon-based epi-wafer structures 14 may be removed, thereby forming a plurality of light emitting structures 16 which have sacr

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